Casey Finstad

Maintained dielectric deposition, thermal diffusion, and metal deposition processes in an wafer fabrication facility: - Led Statistical Factory Control team for the Tucson manufacturing facility, expanding use of SPC introducing statistically based control limits - Began applying SPC principles to electronic test results for completed wafers, preventing scrap - PECVD, LPCVD, PVD, thermal Diffusion, thermal oxidation - Wrote, updated, and trained to Standard Operating Procedures

Dissertation: Gas Phase Surface Preparation and Activation of Silicon Using Ultraviolet Activated Chemistries. Research advisor: Anthony Muscat.